Uv lithography grayscale lithography e beam lithography x ray lithography direct write lithographies and imprint lithographies. Photolithography also called optical lithography or uv lithography is a process used in microfabrication to pattern parts of a thin film or the bulk of a substrate also called a waferit uses light to transfer a geometric pattern from a photomask also called an optical mask to a photosensitive that is light sensitive chemical photoresist on the substrate.
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Liga is a german acronym for lithographie galvanoformung abformung lithography electroplating and molding that describes a fabrication technology used to create high aspect ratio microstructures.
Micromachining lithography. Double sided lithography 3 d assembly wafer bonding molding integration with electronics fluidics unique to mems packaging and testing delicate mechanical structures packaging. The tool wear is a concern the thermal. This chapter presents an introduction and practical approach to lithography and micromachining techniques in the context of mems device fabrication. We describe here an extension to the soft lithography paradigm multilayer soft lithography with which devices consisting of multiple layers may be fabricated from soft materials. This discussion will focus on optical lithography which is simply lithography using a radiation source with wavelengths in the visible spectrum. Soft lithography is an alternative to silicon based micromachining that uses replica molding of nontraditional elastomeric materials to fabricate stamps and microfluidic channels. 4 soft lithography is a popular micromachining technique for rapid fabrication of pdms structures. Fundamentals of bulk micromachining bulk micromachining selectively etch bulk substrate to create microelectronic or micromechanical structures remaining material forms the device structure moving structures trenches and membranes possible important techniques for bulk micromachining lithography and patterning wet and dry etching. Sealing in gas environments interconnect electrical mechanical fluidic. In lithography for micromachining the photosensitive material used is typically a photoresist also called resist other photosensitive polymers are also used. The topics that are discussed here include. Before or after dicing. Micromachining simply consists of forming the monolayer and then physically scratching the surface to remove the thiolates in serial fashion 3132. After removal etching can ensue or a second alkanethiol solution can be introduced generating a mixed sam. Besides these benefits the method has some disadvantages.
However till now pdms has been largely considered incompatible with conventional lithography due to its low surface energy resulting in dewetting of photoresist on the pdms surface. The technology of micromachining method is quick and stable. Many tools have been used to create these scratches. 12 yet soft lithography is a bulk micromachining technique. The microfabrication technologies are divided into three classes namely micromachining x ray lithography galvanic abformung ligaphotolithography and laser assisted deposition.
Chapter 2 Literature Review
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