Williams student member ieee and richard s. W etch known to work but etch rate not measured r film was visibly roughened or attacked i incubation time before etching fully starts.
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Micromachining etch rates ii. Etch rates for micromachining processingpart ii. Etch rates for micromachining processingpart ii kirt r. Bibtex at miscwilliamsetchrates author kirt r. Williams and senior member and kishan gupta and student member and matthew wasilik title etch rates for micromachining processingpart ii year. Williams and kishan gupta and m. Etch rates for micromachining processing ii nmmin kirt r. Muller life fellow ieee abstruct the etch rates for 317 combinations of 16 ma terials single crystal silicon doped and undoped polysilicon several types of silicon dioxide stoichiometric and silicon rich. The etch rates of thermal oxide in different dilutions of hf and bhf are also reported. Etch rates for micromachining processingpart ii 771 there are several types of parylene. Williams senior member ieee kishan gupta student member ieee and matthew wasilik abstract samples of 53 materials that are used or potentially can be used or in the fabrication of microelectromechanical systems and integrated circuits were prepared. Cfsub4subosub2sub plasma and argon ion milling. Part iii carol livermore massachusetts institute of technology. Parylene n can be envi table viii sioned as a polymer of benzene rings with ch groups on oppo etch rates of thermal oxide in various dilutions of hf and bhf nmmin site ends. Williams and kishan gupta of agilent labs and matthew wasilik of bsac revision date19 june 2003 notation. Sample preparation and information about the etches is given.
Etch rates for micromachining processing part ii at inproceedingswilliams2003etchrf titleetch rates for micromachining processing part ii authorkirt r. The etch rates of 620 combinations of these were measured. Etch rates for micromachining processing kirt r. 6777j2372j spring 2007 lecture 3 4. Etch rates for micromachining processing part ii. Gupta and wasilik etch rates for micromachining processing part ii jmems 12 761 778 2003. The etch rates of. The etch rates of 620 combinations of these were measured.
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